Mr. Christoph Serre Profile

Christoph Serre

at Univ de Barcelona

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Author

Publications (5)

Proceedings Article | 27 August 2022 Presentation + Paper

The telescope assembly of the Ariel space mission

Emanuele Pace, Andrea Tozzi, Manuel Adler Abreu, Gustavo Alonso, Bruno Barroqueiro, Giovanni Bianucci, Andrea Bocchieri, Daniele Brienza, Anna Brucalassi, Matteo Burresi, Rodolfo Canestrari, Luca Carbonaro, João Castanheira, Paolo Chioetto, Josep Colomé Ferrer, Carlos Compostizo, Fausto Cortecchia, Fabio D'Anca, Ciro Del Vecchio, Emiliano Diolaiti, Paul Eccleston, Salma Fahmy, Alejandro Fernandez Soler, Debora Ferruzzi, Mauro Focardi, Sara Freitas, Camille Galy, Andres Garcia Perez, Daniele Gottini, Samuele Grella, Gabriele Grisoni, Elisa Guerriero, Jean-Philippe Halain, Marie-Laure Hellin, Lucia Ianni, Marcella Iuzzolino, Delphine Jollet, Matteo Lombini, Ricardo Machado, Giuseppe Malaguti, Alexandra Mazzoli, Giuseppina Micela, Federico Miceli, Giuseppe Mondello, Gianluca Morgante, Lorenzo Mugnai, Luca Naponiello, Vladmiro Noce, Enzo Pascale, Javier Perez Alvarez, Raffaele Piazzolla, Carlo Pompei, Giampaolo Preti, Stephane Roose, Mario Salatti, Jean-Christophe Salvignol, Antonio Scippa, Christophe Serre, Carlo Simoncelli, Frederico Teixeira, Luca Terenzi, Giovanna Tinetti, Leonardo Tommasi, Elisabetta Tommasi Di Vigano, Bart Vandenbussche, Dervis Vernani, Paola Zuppella

Proceedings Volume 12180, 1218011 (2022) https://doi.org/10.1117/12.2629432

KEYWORDS: Mirrors, Telescopes, Optical benches, Aluminum, Off axis mirrors, Manufacturing, Interfaces, Coating, Space operations, Cryogenics

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Proceedings Article | 15 May 2007 Paper

Design and implementation of mechanical resonators for optimized inertial electromagnetic microgenerators

C. Serre, A. Pérez-Rodríguez, N. Fondevilla, E. Martincic, J. Morante, J. Montserrat, J. Esteve

Proceedings Volume 6589, 658905 (2007) https://doi.org/10.1117/12.722275

KEYWORDS: Resonators, Electromagnetism, Polymers, Prototyping, Resistance, Silicon, Manufacturing, Magnetism, Microsystems, Electromechanical design

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Proceedings Article | 30 August 1999 Paper

Doping and structural properties for the phosphorous-doped polysilicon layers used for micromechanical applications

Florin Gaiseanu, Jaume Esteve, Carles Cane, Alejandro Perez-Rodriguez, Juan Morante, Christoph Serre

Proceedings Volume 3874, (1999) https://doi.org/10.1117/12.361246

KEYWORDS: Phosphorus, Diffusion, Doping, Chemical species, Interfaces, Annealing, Silicon, Heat treatments, Oxygen, Oxidation

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Our researches were devoted to the micromechanical elements fabricated by the surface micromachining technology, in order to reduce or to eliminate the internal stress or the stress gradients. We used an analysis based on secondary ion mass spectroscopy and the spreading resistance profiling determinations, correlated with cross-section electron transmission spectroscopy. The stress induced in the polysilicon layers by the technological processes depends on: (i) the conditions of the low pressure chemical vapor deposition process; (ii) the phosphorus doping technique; (iii) the subsequent multi-step annealing processes. In our experiments the LP-CVD conditions were maintained the same, but the condition specified previously as items (ii) was varied by using two different doping techniques: thermal- chemical doping consisting in prediffusion from a POCl₃ source in an open furnace tube; ionic implantation with an energy E equals 65KeV and a dose N equals 4.5 X 10¹⁵ cm^-2. The implantation process was followed by an annealing at 900 degrees C in an oxygen ambient for 30 minutes. The thermal budget was varied after the doping in order to reduce the stress gradient in the polysilicon layers. The results of our analysis allow us to show that: (1) the doping gradients are correlated with the slower phosphorus grains forme by an excess of the oxygen atoms; a concurrent process induced by the silicon self-interstitial injection during the diffusion and oxidation, determines the enhancement of the grain growth and therefore the enhancement of the electrical activation especially near the internal polysilicon interface; (2) the post-doping annealing conditions could be varied in a convenient manner, so that the doping induced stress gradients into the polysilicon layers to be reduced or completely eliminated for suitable micromechanical induced stress gradients into the polysilicon layers to be reduced or completely eliminated for suitable micromechanical applications. The results were used for the process optimization of micromechanical elements. The internal stress was determined by using anew, pull-in voltage method, allowing the comparison of the theory with the experimental data. It was deduced a new form of the equations set useful to extract the mechanical parameters like the internal stress and the Young's module. It was also deduced a simplified approximate formula useful to apply the least square fitting method for the extraction of the mechanical parameters. The results confirms the conclusions of the doping and the structural analysis.

Proceedings Article | 20 April 1998 Paper

Optical characterization of carbon ion implantation into Si and SiGe alloys

Alejandro Perez-Rodriguez, A. Romano-Rodriguez, Christoph Serre, L. Calvo-Barrio, O. Gonzalez-Varona, Juan Morante

Proceedings Volume 3359, (1998) https://doi.org/10.1117/12.306237

KEYWORDS: Silicon carbide, Silicon, Carbon, Germanium, Crystals, Raman spectroscopy, Ion implantation, Ions, Transmission electron microscopy, Raman scattering

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Proceedings Article | 3 November 1995 Paper

Ion-beam-induced amorphization and recrystallization processes in SiC: Raman-scattering analysis

Alejandro Perez-Rodriguez, Christoph Serre, L. Calvo-Barrio, A. Romano-Rodriguez, Juan Morante, Y. Pacaud, R. Koegler, Wolfgang Skorupa

Proceedings Volume 2648, (1995) https://doi.org/10.1117/12.226213

KEYWORDS: Silicon carbide, Crystals, Silicon, Raman spectroscopy, Annealing, Absorption, Carbon, Ion implantation, Raman scattering, Ions

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