Dr. Elizabeth Buitrago
Research Scientist at Paul Scherrer Institut
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10146, 101460G (2017) https://doi.org/10.1117/12.2258217
KEYWORDS: Extreme ultraviolet lithography, Chemically amplified resists, Floods, Lithography, Extreme ultraviolet, Line edge roughness, Image processing, Image enhancement, Ultraviolet radiation, Scanners, Picosecond phenomena, Polymers, Line width roughness, Stochastic processes

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10143, 101430T (2017) https://doi.org/10.1117/12.2260153
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Scanning electron microscopy, Photomasks, Electroluminescence, Printing, Line edge roughness, Semiconducting wafers

Proceedings Article | 27 March 2017 Paper
Oktay Yildirim , Elizabeth Buitrago, Rik Hoefnagels, Marieke Meeuwissen, Sander Wuister, Gijsbert Rispens, Anton van Oosten, Paul Derks, Jo Finders, Michaela Vockenhuber, Yasin Ekinci
Proceedings Volume 10143, 101430Q (2017) https://doi.org/10.1117/12.2257415
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Metals, Deep ultraviolet, Photons, Absorption, Chemically amplified resists, Metrology, Printing, Line width roughness, Scanners, Lithography, Data modeling, Semiconducting wafers, Photon counting, Projection systems

Proceedings Article | 15 September 2016 Paper
Proceedings Volume 9926, 99260T (2016) https://doi.org/10.1117/12.2238805
KEYWORDS: Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Photoresist materials, Electron beam lithography, Diffraction gratings, Optical lithography, Diffraction, Silicon, Systems modeling

SPIE Journal Paper | 18 August 2016
JM3, Vol. 15, Issue 03, 034003, (August 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.034003
KEYWORDS: Line width roughness, Fractal analysis, Extreme ultraviolet, Polymers, Diffusion, Scanning electron microscopy, Spatial frequencies, Photoresist materials, Extreme ultraviolet lithography, Polymethylmethacrylate

SPIE Journal Paper | 15 July 2016
JM3, Vol. 15, Issue 03, 033502, (July 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.033502
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Electroluminescence, Extreme ultraviolet, Scanning electron microscopy, Chemically amplified resists, Lithography, Photomasks, Line edge roughness, Photoresist processing

Proceedings Article | 25 March 2016 Paper
Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara, Gosuke Shiraishi, Kosuke Yoshihara, Yuichi Terashita, Yukie Minekawa, Elizabeth Buitrago, Yasin Ekinci, Oktay Yildirim, Marieke Meeuwissen, Rik Hoefnagels, Gijsbert Rispens, Coen Verspaget, Raymond Maas
Proceedings Volume 9779, 977908 (2016) https://doi.org/10.1117/12.2218936
KEYWORDS: Ultraviolet radiation, Floods, Extreme ultraviolet lithography, Extreme ultraviolet, Electron beam lithography, Picosecond phenomena, Lithography, Photoresist materials, Metals, Semiconductors

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9779, 97790K (2016) https://doi.org/10.1117/12.2217766
KEYWORDS: Line width roughness, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Metals, Oxides, Line edge roughness, Fractal analysis, Polymers, Scanning electron microscopy, Spatial frequencies

Proceedings Article | 22 March 2016 Paper
Seiji Nagahara, Michael Carcasi, Hisashi Nakagawa, Elizabeth Buitrago, Oktay Yildirim, Gosuke Shiraishi, Yuichi Terashita, Yukie Minekawa, Kosuke Yoshihara, Masaru Tomono, Hironori Mizoguchi, Joel Estrella, Tomoki Nagai, Takehiko Naruoka, Satoshi Dei, Masafumi Hori, Akihiro Oshima, Michaela Vockenhuber, Yasin Ekinci, Marieke Meeuwissen, Coen Verspaget, Rik Hoefnagels, Gijsbert Rispens, Raymond Maas, Hideo Nakashima, Seiichi Tagawa
Proceedings Volume 9776, 977607 (2016) https://doi.org/10.1117/12.2219433
KEYWORDS: Floods, Picosecond phenomena, Extreme ultraviolet, Ultraviolet radiation, Extreme ultraviolet lithography, Line edge roughness, Polymers, Absorption, Line width roughness, Image processing

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97760Z (2016) https://doi.org/10.1117/12.2220026
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Chemically amplified resists, Lithography, Light sources, Industrial chemicals, Line edge roughness, Manufacturing, Electronic components, Semiconductors, Line width roughness, Electroluminescence, Scanning electron microscopy, Photomasks, Floods

SPIE Journal Paper | 9 November 2015
Ryan Del Re, James Passarelli, Miriam Sortland, Brian Cardineau, Yasin Ekinci, Elizabeth Buitrago, Mark Neisser, Daniel Freedman, Robert Brainard
JM3, Vol. 14, Issue 04, 043506, (November 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043506
KEYWORDS: Tin, Line edge roughness, Photoresist materials, Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Edge roughness, Crystals, Optical filters

SPIE Journal Paper | 7 August 2015
JM3, Vol. 14, Issue 03, 033507, (August 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.033507
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Photomasks, Scanning electron microscopy, Lithography, Diffraction, Diffraction gratings, Optical lithography

Proceedings Article | 6 April 2015 Paper
Proceedings Volume 9422, 942204 (2015) https://doi.org/10.1117/12.2085936
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Optical lithography, Chemically amplified resists, Lithography, Photomasks, Liquids

Proceedings Article | 13 March 2015 Paper
Elizabeth Buitrago, O. Yildirim, C. Verspaget, N. Tsugama, R. Hoefnagels, G. Rispens, Y. Ekinci
Proceedings Volume 9422, 94221S (2015) https://doi.org/10.1117/12.2085803
KEYWORDS: Line edge roughness, Scanning electron microscopy, Photomasks, Electroluminescence, Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Lithography, Semiconducting wafers, High volume manufacturing

Proceedings Article | 25 July 2013 Paper
Tomasz Bieniek, Grzegorz Janczyk, Paweł Janus, Piotr Grabiec, Marek Nieprzecki, Grzegorz Wielgoszewski, Magdalena Moczała, Teodor Gotszalk, Elizabeth Buitrago, Montserrat Badia, Adrian Ionescu
Proceedings Volume 8902, 89022L (2013) https://doi.org/10.1117/12.2031229
KEYWORDS: Atomic force microscopy, Silicon, Reliability, Scanning electron microscopy, Biosensing, Nanostructures, Nanolithography, Field effect transistors, Sensing systems, Nanowires

Showing 5 of 15 publications
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