Mr. Shoji Nohama Profile

Shoji Nohama

Manager/MDP Section at Sony Corp

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Author

Publications (7)

Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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Proceedings Article | 20 August 2004 Paper

A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, Shigeru Moriya, Tetsuya Kitagawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822

KEYWORDS: Photomasks, Inspection, Lithography, Defect detection, Electron beam lithography, Etching, Semiconducting wafers, Photoresist processing, Monte Carlo methods, Opacity

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 20 May 2004 Paper

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Tetsuya Kitagawa, Masaki Yoshizawa, Kazuya Iwase, Shinji Omori, Shoji Nohama, Hiroyuki Nakano, Shigeru Moriya, Hiroichi Kawahira

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423

KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

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Proceedings Article | 17 December 2003 Paper

Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Shinji Omori, Kazuya Iwase, Keiko Amai, Yoko Watanabe, Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Tetsuya Kitagawa, Kenta Yotsui, Gaku Suzuki, Akira Tamura

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photoresist processing, Image processing, Scanners, Etching, Electroluminescence, Overlay metrology, Charged-particle lithography

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Proceedings Article | 28 August 2003 Paper

State-of-the-art performance of stencil mask for LEEPL

Shoji Nohama, Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504273

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Etching, Image enhancement, Scanning electron microscopy, Line edge roughness, Lithography, Photoresist processing, Defect inspection

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Proceedings Article | 28 August 2003 Paper

On-site use of 1x stencil mask: control over image placement and dimension

Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504258

KEYWORDS: Photomasks, Semiconducting wafers, Contamination, Critical dimension metrology, Lithography, Metrology, Distortion, Overlay metrology, Charged-particle lithography, Silicon

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Showing 5 of 7 publications

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