Dr. Donggun Lee Profile

Dr. Donggun Lee

Sr. Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (12)

Proceedings Article | 16 October 2017 Presentation

EUV mask readiness for HVM (Conference Presentation)

Heebom Kim, Chang Young Jeong, Donggun Lee, Ji Hoon Na, Hwan-Seok Seo, Mun Ja Kim, Sung-Won Kwon, Chan-Uk Jeon

Proceedings Volume 10451, 104510I (2017) https://doi.org/10.1117/12.2280687

KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Inspection, Extreme ultraviolet lithography, High volume manufacturing, Scanners, Transmittance

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Proceedings Article | 28 March 2017 Presentation + Paper

Application of actinic mask review system for the preparation of HVM EUV lithography with defect free mask

Jihoon Na, Donggun Lee, Changhwan Do, Hong-seok Sim, Jung-Hwan Lee, Jungyoup Kim, Hwan-Seok Seo, Heebom Kim, Chan Uk Jeon

Proceedings Volume 10145, 101450M (2017) https://doi.org/10.1117/12.2257390

KEYWORDS: Photomasks, Extreme ultraviolet, Imaging systems, Extreme ultraviolet lithography, Airborne remote sensing, Inspection, Line width roughness, High volume manufacturing, Lead, Metrology, Semiconducting wafers, Scanning electron microscopy, SRAF, Binary data, EUV optics, Mirrors

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Proceedings Article | 24 March 2017 Open Access

Progress in EUV lithography toward manufacturing

Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam

Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043

KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

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Proceedings Article | 28 July 2014 Paper

Extreme ultraviolet mask roughness: requirements, characterization, and modeling

Patrick Naulleau, Suchit Bhattaria, Rick Chao, Rene Claus, Kenneth Goldberg, Frank Goodwin, Eric Gullikson, Donggun Lee, Andy Neureuther, Jong-Ju Park

Proceedings Volume 9256, 92560J (2014) https://doi.org/10.1117/12.2070303

KEYWORDS: Photomasks, Extreme ultraviolet, Speckle, Line width roughness, Inspection, Atomic force microscopy, Lithography, Scattering, Scatter measurement, Line edge roughness

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Proceedings Article | 27 May 2010 Paper

The optical CD metrology for EUV mask

Jin-Back Park, Kyoung-Yoon Bang, Dong-Gun Lee, Hae-Young Jeong, Seung-Soo Kim, Han-Ku Cho

Proceedings Volume 7748, 77481X (2010) https://doi.org/10.1117/12.868293

KEYWORDS: Extreme ultraviolet, Photomasks, Ruthenium, Data modeling, Etching, Atomic force microscopy, EUV optics, Silicon, Scanning electron microscopy, Critical dimension metrology

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Proceedings Article | 26 May 2010 Paper

Effect of EUV exposure upon surface residual chemicals on EUV mask surface

Han-Shin Lee, Jaehyuck Choi, DonGun Lee, Hyungho Ko, SeongSu Kim, Chan-Uk Jeon, HanKu Cho

Proceedings Volume 7748, 774804 (2010) https://doi.org/10.1117/12.868292

KEYWORDS: Carbon, Extreme ultraviolet lithography, Ions, Extreme ultraviolet, Contamination, Photomasks, Reflectivity, Ruthenium, Air contamination, Optical lithography

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Proceedings Article | 20 March 2010 Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Cha-Won Koh, In-Yong Kang, Tae Geun Kim, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proceedings Volume 7636, 76360X (2010) https://doi.org/10.1117/12.847955

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Lithography, Inspection, Line width roughness, Scanners, Critical dimension metrology, Electroluminescence

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Proceedings Article | 20 March 2010 Paper

Printability and inspectability of programmed pit defects on the masks in EUV lithography

In-Yong Kang, Hwan-Seok Seo, Byung-Sup Ahn, Dong-Gun Lee, Dongwan Kim, Sungmin Huh, Cha-Won Koh, Brian Cha, Seoung-Sue Kim, Han-Ku Cho, Iacopo Mochi, Kenneth Goldberg

Proceedings Volume 7636, 76361B (2010) https://doi.org/10.1117/12.847956

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Defect inspection, Extreme ultraviolet, Critical dimension metrology, Visibility, Ion beams, Atomic force microscopy, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Hakseung Han, Sungmin Huh, In-Yong Kang, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proceedings Volume 7271, 72710D (2009) https://doi.org/10.1117/12.813932

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Silicon, Semiconducting wafers, Ruthenium, Extreme ultraviolet, Reflectivity, Phase shifts, Refractive index

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Proceedings Article | 27 March 2008 Paper

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Sungmin Huh, Hoon Kim, Gisung Yoon, Jaehyuck Choi, Han-Shin Lee, Dong Gun Lee, Byungsup Ahn, Hwan-Seok Seo, Dongwan Kim, Seoung Sue Kim, Han Ku Cho, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6921, 692115 (2008) https://doi.org/10.1117/12.772412

KEYWORDS: Photomasks, Carbon, Contamination, Ruthenium, Extreme ultraviolet lithography, Silicon, Critical dimension metrology, Reflectivity, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 24 March 2006 Paper

Improved scatterometry method of critical dimension measurements and its application for control of development process

Irina Pundaleva, Dongseok Nam, Hakseung Han, Donggun Lee, Woosung Han

Proceedings Volume 6152, 61520G (2006) https://doi.org/10.1117/12.657324

KEYWORDS: Critical dimension metrology, Scatterometry, Spectroscopy, Process control, Diffraction, Diffraction gratings, Sensors, In situ metrology, Time metrology, Photomasks

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Proceedings Article | 8 November 2005 Paper

How large MEEF is acceptable for the low-k₁ lithography?

Dongseok Nam, Dong-Gun Lee, Byunggook Kim, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59922W (2005) https://doi.org/10.1117/12.632066

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Tolerancing, Optical testing, Mask making, Scanning electron microscopy, Lithography, Semiconductors, Data processing

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Showing 5 of 12 publications

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