Prof. Seong-Sue Kim Profile

Prof. Seong-Sue Kim

Professor at Seoul National University

SPIE Involvement:

Conference Chair | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Editor | Author

Area of Expertise:

EUV Lithography , EUV Source , EUV Blank , EUV Mask , Optics of EUV , EUV Mask Infra

Publications (35)

Proceedings Article | 24 March 2017 Open Access

Open Access

Presentation + Paper

Progress in EUV lithography toward manufacturing

Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam

Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043

KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Read Abstract +

Proceedings Article | 28 July 2014 Paper

Paper

Ruthenium (Ru) peeling and predicting robustness of the capping layer using finite element method (FEM) modeling

Il-Yong Jang, Arun John, Frank Goodwin, Su-Young Lee, Byung-Gook Kim, Seong-Sue Kim, Chan-Uk Jeon, Jae Hyung Kim, Yong Hoon Jang

Proceedings Volume 9256, 92560I (2014) https://doi.org/10.1117/12.2069991

KEYWORDS: Ruthenium, Silicon, Extreme ultraviolet, Finite element methods, Interfaces, Oxides, Oxygen, Neodymium, Photomasks, Oxidation

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Paper

Aerial image deformation caused by various defects of EUV pellicles

Sung-Gyu Lee, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482V (2014) https://doi.org/10.1117/12.2046623

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Ruthenium, Lithography, Carbon, Computer simulations

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Paper

Durability of Ru-based EUV masks and the improvement

Suyoung Lee, Jungyoup Kim, Soo-Wan Koh, Ilyong Jang, Jaehyuck Choi, Hyungho Ko, Hwan-Seok Seo, Seong-Sue Kim, Byung Gook Kim, Chan-Uk Jeon

Proceedings Volume 9048, 90480J (2014) https://doi.org/10.1117/12.2046556

KEYWORDS: Ruthenium, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Photomasks, Silica, Scanning electron microscopy, Annealing, Oxygen

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Paper

Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seung-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482D (2014) https://doi.org/10.1117/12.2046202

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Silicon, Thin films, Absorption, Optical simulations, Lithography

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Paper

Prospects of DUV OoB suppression techniques in EUV lithography

Chang-Min Park, Insung Kim, Sang-Hyun Kim, Dong-Wan Kim, Myung-Soo Hwang, Soon-Nam Kang, Cheolhong Park, Hyun-Woo Kim, Jeong-Ho Yeo, Seong-Sue Kim

Proceedings Volume 9048, 90480S (2014) https://doi.org/10.1117/12.2046132

KEYWORDS: Deep ultraviolet, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Scanners, Pellicles, Reflectivity, Semiconducting wafers, Particles, Etching

Read Abstract +

Proceedings Article | 18 March 2014 Paper

Paper

Effect of defects on extreme ultraviolet pellicle

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Ji-Won Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482A (2014) https://doi.org/10.1117/12.2046171

KEYWORDS: Pellicles, Contamination, Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Carbon, Extreme ultraviolet, Lithography, Absorption, Silicon

Read Abstract +

Proceedings Article | 28 June 2013 Paper

Paper

Defect printability studies at SEMATECH

Il-Yong Jang, Ranganath Teki, Vibhu Jindal, Frank Goodwin, Masaki Satake, Ying Li, Danping Peng, Sungmin Huh, Seong-Sue Kim

Proceedings Volume 8701, 870111 (2013) https://doi.org/10.1117/12.2028069

KEYWORDS: Semiconducting wafers, Double positive medium, Photomasks, Critical dimension metrology, Data modeling, Calibration, Extreme ultraviolet, Extreme ultraviolet lithography, Printing, Inspection

Read Abstract +

Proceedings Article | 1 April 2013 Paper

Paper

Effects of multilayer period on EUVL imaging for 2X node and beyond

Su-Young Lee, Hwan-Seok Seo, Tae-Geun Kim, Sang-Hyun Kim, Roman Chalykh, Seong-Sue Kim, Chan-Uk Jeon

Proceedings Volume 8679, 867903 (2013) https://doi.org/10.1117/12.2011076

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Cadmium, Neodymium, Ions, Wafer-level optics

Read Abstract +

Proceedings Article | 1 April 2013 Paper

Paper

Defect printability comparing actinic printing with advanced simulation for EUV masks

Il-Yong Jang, Ranganath Teki, Vibhu Jindal, Frank Goodwin, Masaki Satake, Ying Li, Danping Peng, Sungmin Huh, Seong-Sue Kim

Proceedings Volume 8679, 86790H (2013) https://doi.org/10.1117/12.2011493

KEYWORDS: Semiconducting wafers, Double positive medium, Photomasks, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Critical dimension metrology, Inspection, Software development

Read Abstract +

Proceedings Article | 1 April 2013 Paper

Paper

Experimental verification of EUV mask limitations at high numerical apertures

Rikon Chao, Paul Graeupner, Eric Gullikson, Seong-Sue Kim, Jens-Timo Neumann, Ryan Miyakawa, Hwan-Seok Seo, Andy Neureuther, Patrick Naulleau

Proceedings Volume 8679, 86791M (2013) https://doi.org/10.1117/12.2013209

KEYWORDS: Data modeling, Reflectivity, Diffraction, Photomasks, Scatter measurement, Calibration, Extreme ultraviolet, Molybdenum, Silicon, Ruthenium

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Paper

Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Sungmin Huh, In-Yong Kang, Chang Young Jeong, Jihoon Na, Dong Ryul Lee, Hwan-seok Seo, Seong-Sue Kim, Chan-Uk Jeon, Jonggul Doh, Gregg Inderhees, Jinho Ahn

Proceedings Volume 8322, 83220K (2012) https://doi.org/10.1117/12.916021

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Bismuth, Defect inspection, High volume manufacturing, Defect detection, Semiconductors

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Paper

Printability study of pattern defects in the EUV mask as a function of hp nodes

Tae-Geun Kim, Hwan-Seok Seo, In-Yong Kang, Chang Young Jeong, Sungmin Huh, Jihoon Na, Seong-Sue Kim, Chan-Uk Jeon, Iacopo Mochi, Kenneth Goldberg

Proceedings Volume 8322, 83220A (2012) https://doi.org/10.1117/12.916052

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Scanning electron microscopy, Scanners, Lithography, Photoresist processing, Semiconductors

Read Abstract +

Proceedings Article | 26 March 2011 Paper

Paper

Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

Sungmin Huh, In-Yong Kang, Sang-Hyun Kim, Hwan-seok Seo, Dongwan Kim, Jooon Park, Seong-Sue Kim, Han-Ku Cho, Kenneth Goldberg, Iacopo Mochi, Tsutomu Shoki, Gregg Inderhees

Proceedings Volume 7969, 796902 (2011) https://doi.org/10.1117/12.879384

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect detection, Defect inspection, Extreme ultraviolet lithography, Manufacturing, Particles

Read Abstract +

Proceedings Article | 26 May 2010 Paper

Paper

Effect of EUV exposure upon surface residual chemicals on EUV mask surface

Han-Shin Lee, Jaehyuck Choi, DonGun Lee, Hyungho Ko, SeongSu Kim, Chan-Uk Jeon, HanKu Cho

Proceedings Volume 7748, 774804 (2010) https://doi.org/10.1117/12.868292

KEYWORDS: Carbon, Extreme ultraviolet lithography, Ions, Extreme ultraviolet, Contamination, Photomasks, Reflectivity, Ruthenium, Air contamination, Optical lithography

Read Abstract +

Proceedings Article | 23 March 2010 Paper

Paper

Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

Eun-Jin Kim, Jee-Hye You, Seoung-Sue Kim, Han-Ku Cho, Jinho Ahn, Ilsin An, Hye-Keun Oh

Proceedings Volume 7636, 76362K (2010) https://doi.org/10.1117/12.846895

KEYWORDS: Surface roughness, Extreme ultraviolet lithography, Reflectivity, Photomasks, Carbon, Extreme ultraviolet, Ruthenium, Image processing, Contamination, Optical lithography

Read Abstract +

Proceedings Article | 20 March 2010 Paper

Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Cha-Won Koh, In-Yong Kang, Tae Geun Kim, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proceedings Volume 7636, 76360X (2010) https://doi.org/10.1117/12.847955

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Lithography, Inspection, Line width roughness, Scanners, Critical dimension metrology, Electroluminescence

Read Abstract +

Proceedings Article | 20 March 2010 Paper

Paper

Printability and inspectability of programmed pit defects on the masks in EUV lithography

In-Yong Kang, Hwan-Seok Seo, Byung-Sup Ahn, Dong-Gun Lee, Dongwan Kim, Sungmin Huh, Cha-Won Koh, Brian Cha, Seoung-Sue Kim, Han-Ku Cho, Iacopo Mochi, Kenneth Goldberg

Proceedings Volume 7636, 76361B (2010) https://doi.org/10.1117/12.847956

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Defect inspection, Extreme ultraviolet, Critical dimension metrology, Visibility, Ion beams, Atomic force microscopy, Semiconducting wafers

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Paper

Line edge and width roughness dependency on each ingredient of extreme ultraviolet molecular resist

Hyunsu Kim, In Wook Cho, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proceedings Volume 7273, 72732E (2009) https://doi.org/10.1117/12.814055

KEYWORDS: Line edge roughness, Monte Carlo methods, Extreme ultraviolet lithography, Diffusion, Molecules, Extreme ultraviolet, Image processing, Lithography, Polymers, Line width roughness

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Paper

Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

In Wook Cho, Joon-Min Park, Hyunsu Kim, Joo-Yoo Hong, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proceedings Volume 7273, 72732D (2009) https://doi.org/10.1117/12.814108

KEYWORDS: Line edge roughness, Line width roughness, Photoresist processing, Lithography, Polymers, Surface roughness, Diffusion, Glasses, Extreme ultraviolet lithography, Monte Carlo methods

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Paper

Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography

Eun-Jin Kim, Jee-Hye You, Seong-Sue Kim, Han-Ku Cho, Ilsin An, Hye-Keun Oh

Proceedings Volume 7271, 727143 (2009) https://doi.org/10.1117/12.814031

KEYWORDS: Lithographic illumination, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Optical lithography, Lithography, Reflectivity, Coherence (optics), Resolution enhancement technologies

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Paper

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Hakseung Han, Sungmin Huh, In-Yong Kang, Hoon Kim, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho

Proceedings Volume 7271, 72710D (2009) https://doi.org/10.1117/12.813932

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Silicon, Semiconducting wafers, Ruthenium, Extreme ultraviolet, Reflectivity, Phase shifts, Refractive index

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Paper

Analysis of process margin in EUV mask repair with nano-machining

Su-Young Lee, Geun-Bae Kim, Hong-Seok Sim, Sang-Hyeon Lee, Hwa-Sung Kim, Jung-Hwan Lee, Hwan-Seok Seo, Hak-Seung Han, Seong-Sue Kim, Seong-Yong Moon, Sang-Gyun Woo, Ron Bozak, Andrew Dinsdale, Tod Robinson, David Lee, HanKu Cho

Proceedings Volume 7122, 71222I (2008) https://doi.org/10.1117/12.801415

KEYWORDS: Photomasks, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers, Diffractive optical elements, Image processing, Critical dimension metrology, Factor analysis

Read Abstract +

Proceedings Article | 27 March 2008 Paper

Paper

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Sungmin Huh, Hoon Kim, Gisung Yoon, Jaehyuck Choi, Han-Shin Lee, Dong Gun Lee, Byungsup Ahn, Hwan-Seok Seo, Dongwan Kim, Seoung Sue Kim, Han Ku Cho, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6921, 692115 (2008) https://doi.org/10.1117/12.772412

KEYWORDS: Photomasks, Carbon, Contamination, Ruthenium, Extreme ultraviolet lithography, Silicon, Critical dimension metrology, Reflectivity, Extreme ultraviolet, Semiconducting wafers

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Paper

Overlay metrology for dark hard mask process: simulation and experiment study

Jangho Shin, Roman Chalykh, Hyunjae Kang, SeongSue Kim, SukJoo Lee, Han-Ku Cho

Proceedings Volume 6518, 65182U (2007) https://doi.org/10.1117/12.711389

KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Optical alignment, Image processing, Photoresist materials, Semiconductors, Image quality, Scanners, Lithography

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Paper

Image analysis of alignment and overlay marks with compound structure

Roman Chalykh, Irina Pundaleva, Jang-Ho Shin, Seong-Sue Kim, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6518, 65182D (2007) https://doi.org/10.1117/12.711277

KEYWORDS: Overlay metrology, Optical alignment, Antireflective coatings, Image analysis, Coating, Semiconductors, Image quality, Finite-difference time-domain method, Optical lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Paper

Properties of EUVL masks as a function of capping layer and absorber stack structures

Hwan-Seok Seo, Jinhong Park, Seung-Yoon Lee, Joo-On Park, Hun Kim, Seong-Sue Kim, Han-Ku Cho

Proceedings Volume 6517, 65171G (2007) https://doi.org/10.1117/12.713301

KEYWORDS: Reflectivity, Silicon, Ruthenium, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Molybdenum, Multilayers, Refractive index, Ion beams

Read Abstract +

Proceedings Article | 20 March 2007 Paper

Paper

The effect of localized mask density variations on image quality in EUV lithography

Jinhong Park, Hwanseok Seo, Seong-Sue Kim, HanKu Cho, Joo-Tae Moon

Proceedings Volume 6517, 651723 (2007) https://doi.org/10.1117/12.713303

KEYWORDS: Stray light, Photomasks, Image quality, Light scattering, Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Reticles, Lithography, Reflectivity

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Paper

Simulation of critical dimension and profile metrology based on scatterometry method

Roman Chalykh, Irina Pundaleva, SeongSue Kim, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6349, 63491K (2006) https://doi.org/10.1117/12.688623

KEYWORDS: Critical dimension metrology, Scatterometry, Polarization, Diffraction, Diffraction gratings, Metrology, Scatter measurement, Overlay metrology, Magnetism, Light scattering

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Paper

Simulation and experiments for inspection properties of EUV mask defects

Jinhong Park, Seong-Sue Kim, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6283, 62833E (2006) https://doi.org/10.1117/12.681833

KEYWORDS: Inspection, Photomasks, Confocal microscopy, Extreme ultraviolet, Semiconducting wafers, Reflectivity, Defect detection, Deep ultraviolet, Visible radiation, Imaging systems

Read Abstract +

Proceedings Article | 23 March 2006 Paper

Paper

Defect inspection of EUV mask blank using confocal microscopy: simulation and experiment

Seong-Sue Kim, Jinhong Park, Roman Chalykh, Jiehun Kang, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6151, 61511C (2006) https://doi.org/10.1117/12.656221

KEYWORDS: Confocal microscopy, Photomasks, Extreme ultraviolet, Smoothing, Defect inspection, Microscopes, Data modeling, Molybdenum, Silicon, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Paper

Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Jangho Shin, SukJoo Lee, Hochul Kim, Chan Hwang, SeongSue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598655

KEYWORDS: Fiber optic illuminators, Reticles, Semiconducting wafers, Image sensors, Photoresist materials, Overlay metrology, Optical lithography, Scanners, Optics manufacturing, Metrology

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Paper

Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Roman Chalykh, Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601142

KEYWORDS: Optical alignment, Diffraction, Diffraction gratings, Overlay metrology, Image quality, Silica, Finite-difference time-domain method, Near field, Extreme ultraviolet, Signal processing

Read Abstract +

Proceedings Article | 6 May 2005 Paper

Paper

Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Seong-Sue Kim, Roman Chalyck, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600459

KEYWORDS: Photomasks, Defect inspection, Extreme ultraviolet lithography, Confocal microscopy, Near field, Inspection, Fourier optics, Near field optics, Projection systems, Light sources

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Paper

Image simulation in immersion lithography using Debye integral and scattering matrix method

Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534836

KEYWORDS: Immersion lithography, Lithography, Polarization, Scattering, Wavefronts, Reflectivity, Water, Wave propagation, Photomasks, Infrared imaging

Read Abstract +

Showing 5 of 35 publications

Proceedings Volume Editor (1)

SPIE Conference Volume | 4 December 2023

Photomask Technology 2023

Conference Committee Involvement (14)

Photomask Technology 2024

30 September 2024 | Monterey, California, United States

Photomask Technology 2023

2 October 2023 | Monterey, California, United States

Extreme Ultraviolet (EUV) Lithography XII

22 February 2021 | Online Only, California, United States

Extreme Ultraviolet (EUV) Lithography XI

24 February 2020 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography X

25 February 2019 | San Jose, California, United States

Showing 5 of 14 Conference Committees

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement