Dr. Jonathan L. Cobb
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 22 February 2021 Presentation + Paper
Shela Aboud, Joanne Huang, Jonathan Cobb, Tue Gunst, Plamen Asenov, Thuc Dam, Ricardo Borges
Proceedings Volume 11614, 116140S (2021) https://doi.org/10.1117/12.2583912
KEYWORDS: Metals, Standards development, Ruthenium, Performance modeling, Copper, Transistors, Scattering, Oscillators, Materials processing, Electronic design automation

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11328, 113280C (2020) https://doi.org/10.1117/12.2554025
KEYWORDS: Fin field effect transistors, Standards development, Transistors, Clocks, Device simulation, TCAD, Logic, Design for manufacturability

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7969, 79690S (2011) https://doi.org/10.1117/12.880230
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Reticles, Extreme ultraviolet lithography, 193nm lithography, Lithography, Manufacturing, Optical lithography, Model-based design

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 763627 (2010) https://doi.org/10.1117/12.848290
KEYWORDS: Extreme ultraviolet, Optical proximity correction, Photomasks, Calibration, Optical lithography, Data modeling, Extreme ultraviolet lithography, Point spread functions, Reticles, 3D modeling

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71223Z (2008) https://doi.org/10.1117/12.801593
KEYWORDS: Optical proximity correction, Atrial fibrillation, Lithography, Lithographic illumination, Manufacturing, Resolution enhancement technologies, Optical lithography, Process modeling, Semiconductors, Semiconducting wafers

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65200N (2007) https://doi.org/10.1117/12.715166
KEYWORDS: Optical lithography, Optical proximity correction, Error analysis, Resolution enhancement technologies, SRAF, Lithography, OLE for process control, Photomasks, Manufacturing, Metrology

Proceedings Article | 26 March 2007 Paper
Young-Chang Kim, Insung Kim, JeongGeun Park, Sangwook Kim, Sungsoo Suh, Yongjin Cheon, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, Jootae Moon, Jonathan Cobb, Sooryong Lee
Proceedings Volume 6520, 65200T (2007) https://doi.org/10.1117/12.711832
KEYWORDS: Optical proximity correction, 3D modeling, Photomasks, Near field, Polarization, Chromium, 3D image processing, Transmittance, Binary data, Optical lithography

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63493I (2006) https://doi.org/10.1117/12.686394
KEYWORDS: Optical proximity correction, Near field, Polarization, 3D modeling, Photomasks, Critical dimension metrology, Chromium, Binary data, Optical lithography, Transmittance

Proceedings Article | 21 March 2006 Paper
Proceedings Volume 6154, 615411 (2006) https://doi.org/10.1117/12.659353
KEYWORDS: Photomasks, Polarization, Etching, Plasma etching, Manufacturing, Plasma, Semiconducting wafers, Chromium, Lithography, Chlorine

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61541D (2006) https://doi.org/10.1117/12.659390
KEYWORDS: Photomasks, Polarization, Etching, Plasma etching, Manufacturing, Plasma, Semiconducting wafers, Chromium, Lithography, Chlorine

Proceedings Article | 12 May 2005 Paper
Jonathan Cobb, Bernard Roman, Vladimir Ivin, M. Sarychev
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601175
KEYWORDS: Reticles, Critical dimension metrology, Photomasks, Monte Carlo methods, Near field, Resolution enhancement technologies, Binary data, Phase shifts, Tellurium, Polarization

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601011
KEYWORDS: Photomasks, Manufacturing, Etching, Plasma etching, Lithography, Chromium, Phase shifts, Reticles, Semiconducting wafers, Sputter deposition

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600912
KEYWORDS: Reticles, Photomasks, Manufacturing, Inspection, Critical dimension metrology, Semiconducting wafers, Optical proximity correction, Lithography, Logic, Etching

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601584
KEYWORDS: Photomasks, Image processing, Manufacturing, Image transmission, Lithography, Photoresist materials, Nanoimprint lithography, Image resolution, Semiconductors, 193nm lithography

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569318
KEYWORDS: Inspection, Photomasks, Defect inspection, Scanning electron microscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Printing, Defect detection, Reflectivity, Multilayers

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537107
KEYWORDS: Critical dimension metrology, Photomasks, Extreme ultraviolet, Error analysis, Monte Carlo methods, Semiconducting wafers, Lithography, SRAF, Statistical analysis, Extreme ultraviolet lithography

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537366
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction, Lithography, Photomasks, Critical dimension metrology, Data modeling, Monte Carlo methods, Scanners, Scanning electron microscopy

Proceedings Article | 14 May 2004 Paper
Richard Peters, Colita Parker, Jonathan Cobb, Eric Luckowski, Eric Weisbrod, Bill Dauksher
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535643
KEYWORDS: Photoresist processing, Etching, Semiconducting wafers, Resistance, Scanning electron microscopy, Optical lithography, Extreme ultraviolet lithography, Image processing, Lithography, Line edge roughness

Proceedings Article | 12 May 2004 Paper
Patrick Montgomery, Richard Peters, Cesar Garza, Jonathan Cobb, Bill Darlington, Colita Parker, Stan Filipiak, Danny Babbitt
Proceedings Volume 5753, (2004) https://doi.org/10.1117/12.600785
KEYWORDS: Line edge roughness, Etching, Photoresist processing, Edge roughness, Fluorine, Silicon, Lithography, Yield improvement, Transistors, Scanning electron microscopy

Proceedings Article | 3 May 2004 Paper
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.537655
KEYWORDS: Reticles, Optical proximity correction, Design for manufacturing, Lithography, Logic, Model-based design, Metals, Manufacturing, Optical lithography, Yield improvement

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518544
KEYWORDS: Extreme ultraviolet, Photomasks, Waveguides, Light scattering, Electromagnetism, Scattering, Reflectivity, Diffraction, Lithographic illumination, Electromagnetic scattering

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484963
KEYWORDS: Extreme ultraviolet, Photomasks, Waveguides, Extreme ultraviolet lithography, Reflectivity, 3D modeling, Lithography, Computer simulations, Dielectrics, Diffraction

Proceedings Article | 16 June 2003 Paper
Jonathan Cobb, Frances Houle, Gregg Gallatin
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484730
KEYWORDS: Monte Carlo methods, Photon transport, Absorption, Line edge roughness, Edge roughness, Extreme ultraviolet lithography, Statistical analysis, Resist chemistry, Extreme ultraviolet, Lithography

Proceedings Article | 12 June 2003 Paper
Richard Peters, Sergei Postnikov, Jonathan Cobb, S. Dakshina-Murthy, Tab Stephens, Colita Parker, Eric Luckowski, Arturo Martinez, Wei Wu, Scott Hector
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485122
KEYWORDS: Photoresist processing, Transistors, Etching, Semiconducting wafers, Plasma etching, Plasma, Silicon, Resistance, Defect inspection, Optical lithography

Proceedings Article | 12 June 2003 Paper
Jonathan Cobb, Shahid Rauf, Aaron Thean, S. Dakshina-Murthy, Tab Stephens, Colita Parker, Richard Peters, Vivek Rao
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485169
KEYWORDS: Line edge roughness, Etching, 3D modeling, Diffusion, Process modeling, Instrument modeling, Photoresist processing, Photoresist materials, Edge roughness, Image processing

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487739
KEYWORDS: Lithography, Image resolution, Polymers, Diffusion, Semiconductors, Photoresist processing, Image processing, Chemically amplified resists, Line edge roughness, Molecules

Proceedings Article | 2 June 2003 Paper
Richard Peters, Kevin Lucas, Jonathan Cobb, Colita Parker, Kyle Patterson, Robb McCauley, Monique Ercken, Frieda Van Roey, Nadia Vandenbroeck, Ivan Pollentier
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485027
KEYWORDS: Line edge roughness, Monochromatic aberrations, Transistors, Scanning electron microscopy, 193nm lithography, Cadmium, Optical lithography, Extreme ultraviolet, Etching, Control systems

Proceedings Article | 24 July 2002 Paper
Jonathan Cobb, S. Dakshina-Murthy, Colita Parker, Eric Luckowski, Arturo Martinez, Richard Peters, Wei Wu, Scott Hector
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474226
KEYWORDS: Etching, Line edge roughness, Photoresist processing, Semiconducting wafers, Scanning electron microscopy, Transistors, Optical lithography, Photoresist materials, Electron beam lithography, Image processing

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474227
KEYWORDS: Line edge roughness, Photoresist processing, 193nm lithography, Lithography, Semiconducting wafers, Fluorine, Scanning electron microscopy, Molecules, Scanners, Matrices

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472316
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Photoresist materials, Scanning electron microscopy, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Deep ultraviolet, Semiconductors, Photoresist developing

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472324
KEYWORDS: Phase shifts, Binary data, Chromium, Photomasks, Reflectivity, Inspection, Signal attenuation, Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers

Proceedings Article | 24 August 2001 Paper
Jonathan Cobb, Will Conley, Todd Guenther, Fred Huang, Jen-Jiang Lee, Tom Lii, S. Dakshina-Murthy, Colita Parker, Saifi Usmani, Wei Wu, Scott Hector
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436856
KEYWORDS: Etching, Photoresist processing, Coating, Extreme ultraviolet lithography, Optical lithography, Semiconducting wafers, Manufacturing, Resistance, Metals, Cadmium

Proceedings Article | 20 August 2001 Paper
Scott Hector, Jonathan Cobb, Vladimir Ivin, Mikhail Silakov, George Babushkin
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436640
KEYWORDS: Photons, Dielectrics, Monte Carlo methods, Absorption, Electron beam lithography, Projection lithography, Solids, Oxides, Chemical species, CMOS devices

Proceedings Article | 2 June 2000 Paper
Uzodinma Okoroanyanwu, Jonathan Cobb, Paul Dentinger, Craig Henderson, Veena Rao, Kevin Monahan, David Luo, Christopher Pike
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386506
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Particles, Confocal microscopy, Coating, Metrology, Microscopes, Polymers, Defect detection, Air contamination

Proceedings Article | 25 June 1999 Paper
Veena Rao, Jonathan Cobb, Craig Henderson, Uzodinma Okoroanyanwu, Dan Bozman, Pawitter Mangat, Robert Brainard, Joseph Mackevich
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351135
KEYWORDS: Line edge roughness, Extreme ultraviolet, Photoresist processing, Lithography, Etching, Extreme ultraviolet lithography, Polymers, Photoresist materials, Optical lithography, Silicon

Proceedings Article | 25 June 1999 Paper
John Goldsmith, Kurt Berger, Dan Bozman, Gregory Cardinale, Daniel Folk, Craig Henderson, Donna O'Connell, Avijit Ray-Chaudhuri, Kenneth Stewart, Daniel Tichenor, Henry Chapman, Richard Gaughan, Russell Hudyma, Claude Montcalm, Eberhard Spiller, John Taylor, Jeffrey Williams, Kenneth Goldberg, Eric Gullikson, Patrick Naulleau, Jonathan Cobb
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351097
KEYWORDS: Cameras, Extreme ultraviolet, Imaging systems, Lithography, Extreme ultraviolet lithography, Projection systems, Photoresist developing, Photomasks, Wavefronts, Photoresist materials

Proceedings Article | 11 June 1999 Paper
Carl Kessel, Larry Boardman, Steven Rhyner, Jonathan Cobb, Craig Henderson, Veena Rao, Uzodinma Okoroanyanwu
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350204
KEYWORDS: Polymers, Silicon, Extreme ultraviolet, Etching, Lithography, Photoresist materials, Extreme ultraviolet lithography, Coating, Head-mounted displays, Line edge roughness

Showing 5 of 37 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top