Dr. Kyle Patterson
Engineer at NXP Semiconductors
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 28 March 2007 Paper
Proceedings Volume 6521, 65211N (2007) https://doi.org/10.1117/12.713044
KEYWORDS: Calibration, Optical proximity correction, Data modeling, Scanning electron microscopy, Model-based design, Critical dimension metrology, Process modeling, Manufacturing, Data processing, Metrology

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560R (2006) https://doi.org/10.1117/12.658823
KEYWORDS: Resolution enhancement technologies, Optical proximity correction, Process modeling, Error analysis, Image processing, Semiconducting wafers, Reticles, Optical lithography, Photomasks, Model-based design

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 599219 (2005) https://doi.org/10.1117/12.632096
KEYWORDS: Data modeling, Calibration, Statistical modeling, Printing, Critical dimension metrology, Electroluminescence, Convolution, Modeling, Mathematical modeling, Computer simulations

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 59920R (2005) https://doi.org/10.1117/12.632561
KEYWORDS: Etching, Optical lithography, Photomasks, Quartz, Phase shifts, Printing, Electroluminescence, Manufacturing, Chromium, Optical proximity correction

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617412
KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Multilayers, Optical lithography, Photomasks, Optics manufacturing, Semiconducting wafers, Metals, Manufacturing, Lithography

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617433
KEYWORDS: Critical dimension metrology, Etching, Photomasks, Convolution, Optical proximity correction, Electrons, Point spread functions, Optical lithography, Scattering, Light scattering

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601756
KEYWORDS: Photomasks, Lithography, Monte Carlo methods, Critical dimension metrology, Optical proximity correction, Polarization, Lithographic illumination, Optical lithography, SRAF, Nanoimprint lithography

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600471
KEYWORDS: Data modeling, Optical proximity correction, Calibration, Printing, Optical lithography, Scanning electron microscopy, Process modeling, 3D modeling, Lithography, Photomasks

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.601166
KEYWORDS: Calibration, Data modeling, Optical proximity correction, Statistical modeling, Performance modeling, Model-based design, Photoresist materials, Printing, Coastal modeling, Optimization (mathematics)

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600887
KEYWORDS: Transistors, Ions, Optical proximity correction, Lithography, Optical lithography, Lithium, Logic, Photomasks, Lithographic illumination, Manufacturing

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.601105
KEYWORDS: Model-based design, Optical proximity correction, Optical lithography, Data modeling, Lithography, Systems modeling, Semiconductors, Resolution enhancement technologies, Reticles, Semiconducting wafers

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569257
KEYWORDS: Semiconducting wafers, Metrology, Reticles, Lithography, Feature extraction, Optical proximity correction, Photomasks, Photoresist processing, Calibration, Array processing

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.556617
KEYWORDS: Electroluminescence, Critical dimension metrology, Photomasks, Semiconducting wafers, Lithography, Cadmium, Logic devices, Process control, Sodium, SRAF

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537190
KEYWORDS: Optical proximity correction, Data modeling, Calibration, Printing, Visualization, Failure analysis, Bridges, Scattering, Image processing, Semiconducting wafers

Proceedings Article | 2 June 2003 Paper
Richard Peters, Kevin Lucas, Jonathan Cobb, Colita Parker, Kyle Patterson, Robb McCauley, Monique Ercken, Frieda Van Roey, Nadia Vandenbroeck, Ivan Pollentier
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485027
KEYWORDS: Line edge roughness, Monochromatic aberrations, Transistors, Scanning electron microscopy, 193nm lithography, Cadmium, Optical lithography, Extreme ultraviolet, Etching, Control systems

Proceedings Article | 30 July 2002 Paper
Christophe Pierrat, Michel Cote, Kyle Patterson
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474582
KEYWORDS: Phase shifts, Photomasks, Binary data, Lithography, 193nm lithography, Optical proximity correction, Printing, Scanners, Standards development, Resolution enhancement technologies

Proceedings Article | 30 July 2002 Paper
Kevin Lucas, Sergei Postnikov, Kyle Patterson, Chi-Min Yuan, Carla Nelson-Thomas, Matthew Thompson, Russell Carter, Lloyd Litt, Patrick Montgomery, Karl Wimmer
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474563
KEYWORDS: Optical proximity correction, Lithography, Reticles, Model-based design, Semiconducting wafers, Photomasks, 193nm lithography, Optical lithography, Lithographic illumination, Data modeling

Proceedings Article | 30 July 2002 Paper
Kyle Patterson, Lloyd Litt, John Maltabes, Greg Hughes, Trish Robertson, B. Montgomery
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474481
KEYWORDS: Reticles, Photomasks, Data modeling, Etching, Quartz, Semiconducting wafers, Optical lithography, Phase shifts, Lithography, Phase shifting

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436831
KEYWORDS: Polymers, Absorbance, Photoresist materials, Semiconducting wafers, Head-mounted displays, Coating, Liquids, Analog electronics, Magnesium, Nitrogen

Proceedings Article | 22 August 2001 Paper
Kyle Patterson, John Sturtevant, John Alvis, Nancy Benavides, Douglas Bonser, Nigel Cave, Carla Nelson-Thomas, William Taylor, Karen Turnquest
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436808
KEYWORDS: Line edge roughness, Transistors, Semiconducting wafers, Optical lithography, Etching, Scanning electron microscopy, Critical dimension metrology, Photoresist materials, Reflectivity, Binary data

Proceedings Article | 23 June 2000 Paper
Kyle Patterson, Mikio Yamachika, Raymond Hung, Colin Brodsky, Shintaro Yamada, Mark Somervell, Brian Osborn, Daniel Hall, Gordana Dukovic, Jeff Byers, Will Conley, C. Grant Willson
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388320
KEYWORDS: Photoresist materials, Polymers, Absorbance, Photoresist developing, Transparency, Deep ultraviolet, Etching, Vacuum ultraviolet, Resistance, Fluorine

Proceedings Article | 23 June 2000 Paper
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388311
KEYWORDS: Polymers, Line edge roughness, Glasses, Semiconducting wafers, Imaging systems, Etching, FT-IR spectroscopy, Photoresist materials, Image resolution, Absorbance

Proceedings Article | 29 June 1998 Paper
Shintaro Yamada, David Medeiros, Kyle Patterson, Wei-Lun Jen, Timo Rager, Qinghuang Lin, Carlos Lenci, Jeff Byers, Jennifer Havard, Dario Pasini, Jean Frechet, C. Grant Willson
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312414
KEYWORDS: Polymers, Photoresist materials, Switches, Photoresist developing, Etching, Imaging systems, Resistance, Photoresist processing, Polymer thin films, Chromophores

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312356
KEYWORDS: Polymers, Etching, Photoresist materials, Lithography, Photomasks, Resistance, Photoresist developing, Polymerization, Bioalcohols, Absorbance

Proceedings Article | 29 June 1998 Paper
Jennifer Havard, Dario Pasini, Jean Frechet, David Medeiros, Kyle Patterson, Shintaro Yamada, C. Grant Willson
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312351
KEYWORDS: Polymers, Carbonates, Chemistry, Molecules, Switches, Polymer thin films, Spectroscopy, Nitrogen, Chemical species, Standards development

Showing 5 of 25 publications
Conference Committee Involvement (4)
Advances in Resist Materials and Processing Technology XXIV
26 February 2007 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIII
20 February 2006 | San Jose, California, United States
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
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