Dr. Guido Schiffelers
Principal Architect at ASML Netherlands BV
SPIE Involvement:
Author
Publications (22)

SPIE Journal Paper | 6 December 2024
JM3, Vol. 24, Issue 01, 011009, (December 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011009
KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Reticles, Scanners, Mirrors, Sensors, Light sources and illumination, Design, Imaging systems, Extreme ultraviolet lithography

Proceedings Article | 21 November 2024 Presentation + Paper
Proceedings Volume 13215, 1321506 (2024) https://doi.org/10.1117/12.3035360
KEYWORDS: Photomasks, SRAF, Printing, Manufacturing, Standards development, Source mask optimization, Phase shifting, Lithography, Extreme ultraviolet lithography, Attenuation

Proceedings Article | 23 March 2020 Paper
Mark van de Kerkhof, Fei Liu, Marieke Meeuwissen, Xueqing Zhang, Robert de Kruif, Natalia Davydova, Guido Schiffelers, Felix Wählisch, Eelco van Setten, Wouter Varenkamp, Kees Ricken, Laurens de Winter, John McNamara, Muharrem Bayraktar
Proceedings Volume 11323, 1132321 (2020) https://doi.org/10.1117/12.2551021
KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Extreme ultraviolet lithography, Reflectivity, Reticles, Imaging systems, Scanners

Proceedings Article | 26 September 2019 Presentation + Paper
Proceedings Volume 11147, 111470E (2019) https://doi.org/10.1117/12.2537104
KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

Proceedings Article | 26 March 2019 Presentation + Paper
Pieter Vanelderen, Victor Blanco, Ming Mao, Yoann Tomczak, David de Roest, Nicola Kissoon, Paulina Rincon Delgadillo, Gijsbert Rispens, Guido Schiffelers, Abhinav Pathak, Frederic Lazzarino, Danilo De Simone, Etienne de Poortere, Moyra Mc Manus, Daniele Piumi, Eric Hendrickx, Geert Vandenberghe
Proceedings Volume 10957, 109570S (2019) https://doi.org/10.1117/12.2515503
KEYWORDS: Etching, Lithography, Extreme ultraviolet lithography, Photoresist materials, Logic, Optical lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570H (2019) https://doi.org/10.1117/12.2514719
KEYWORDS: Critical dimension metrology, Etching, Metrology, Lithography, Semiconducting wafers, Photoresist processing, Statistical analysis, Optical lithography, Stochastic processes

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10959, 109590T (2019) https://doi.org/10.1117/12.2515175
KEYWORDS: Photomasks, Line width roughness, Semiconducting wafers, Metrology, Stochastic processes, Scanning electron microscopy, Critical dimension metrology, Data modeling, Linear filtering, Extreme ultraviolet lithography

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 108090M (2018) https://doi.org/10.1117/12.2501797
KEYWORDS: Semiconducting wafers, Photomasks, Critical dimension metrology, Scanners, Stochastic processes, Scanning electron microscopy, Mirrors, Metrology, Extreme ultraviolet lithography

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 1080905 (2018) https://doi.org/10.1117/12.2503343
KEYWORDS: Metals, Optical lithography, Extreme ultraviolet lithography, Logic, Photomasks, Scanners, Double patterning technology, High volume manufacturing, Source mask optimization, Semiconducting wafers

SPIE Journal Paper | 17 September 2018
JM3, Vol. 17, Issue 04, 041013, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041013
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet, Stochastic processes, Lithography, Printing, Pellicles, Scanning electron microscopy, Extreme ultraviolet lithography

Proceedings Article | 21 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830L (2018) https://doi.org/10.1117/12.2299639
KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830I (2018) https://doi.org/10.1117/12.2299509
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Stochastic processes, Pellicles, Extreme ultraviolet, Scanning electron microscopy, Inspection, Extreme ultraviolet lithography, Lithography

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761S (2016) https://doi.org/10.1117/12.2220025
KEYWORDS: Neodymium, Photomasks, Semiconducting wafers, Extreme ultraviolet, Image processing, Lithography, Lithographic illumination, Extreme ultraviolet lithography, Optical proximity correction, Atrial fibrillation, Reticles, Printing, Deep ultraviolet

Proceedings Article | 4 September 2015 Paper
N. Davydova, R. Kottumakulal, J. Hageman, J. McNamara, R. Hoefnagels, V. Vaenkatesan, A. van Dijk, K. Ricken, L. de Winter, R. de Kruif, R. Jonckheere, T. Hollink, G. Schiffelers, E. van Setten, P. Colsters, W. Liebregts, R. Pellens, J. van Dijk
Proceedings Volume 9661, 96610B (2015) https://doi.org/10.1117/12.2195733
KEYWORDS: Aluminum, Deep ultraviolet, Reflectivity, Reticles, Semiconducting wafers, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Coating, Reflection

Proceedings Article | 17 October 2014 Paper
Natalia Davydova, Eelco van Setten, Robert de Kruif, Brid Connolly, Norihito Fukugami, Yutaka Kodera, Hiroaki Morimoto, Yo Sakata, Jun Kotani, Shinpei Kondo, Tomohiro Imoto, Haiko Rolff, Albrecht Ullrich, Ramasubramanian Kottumakulal Jaganatharaja, Ad Lammers, Dorothe Oorschot, Cheuk-Wah Man, Guido Schiffelers, Joep van Dijk
Proceedings Volume 9231, 923102 (2014) https://doi.org/10.1117/12.2066299
KEYWORDS: Deep ultraviolet, Reflectivity, Extreme ultraviolet, Photomasks, Reticles, Scanners, Aluminum, Extreme ultraviolet lithography, Atomic force microscopy, Semiconducting wafers

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 923108 (2014) https://doi.org/10.1117/12.2065945
KEYWORDS: Logic, Optical proximity correction, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optical lithography, Calibration, Extreme ultraviolet lithography, Critical dimension metrology, Image resolution

Proceedings Article | 28 July 2014 Paper
Natalia Davydova, Eelco van Setten, Robert de Kruif, Brid Connolly, Norihito Fukugami, Yutaka Kodera, Hiroaki Morimoto, Yo Sakata, Jun Kotani, Shinpei Kondo, Tomohiro Imoto, Haiko Rolff, Albrecht Ullrich, Ad Lammers, Guido Schiffelers, Joep van Dijk
Proceedings Volume 9256, 925602 (2014) https://doi.org/10.1117/12.2072945
KEYWORDS: Reticles, Photomasks, Extreme ultraviolet, Semiconducting wafers, Reflectivity, 3D metrology, Deep ultraviolet, Neodymium, Atomic force microscopy, Scanners

Proceedings Article | 17 April 2014 Paper
Rudy Peeters, Sjoerd Lok, Joerg Mallman, Martijn van Noordenburg, Noreen Harned, Peter Kuerz, Martin Lowisch, Eelco van Setten, Guido Schiffelers, Alberto Pirati, Judon Stoeldraijer, David Brandt, Nigel Farrar, Igor Fomenkov, Herman Boom, Hans Meiling, Ron Kool
Proceedings Volume 9048, 90481J (2014) https://doi.org/10.1117/12.2046909
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Logic, Imaging systems, Scanners, Optical proximity correction, Metrology, Photomasks

Proceedings Article | 1 October 2013 Paper
Eelco van Setten, Guido Schiffelers, Cristina Toma, Jo Finders, Dorothe Oorschot, Joep van Dijk, Sjoerd Lok, Rudy Peeters
Proceedings Volume 8886, 888604 (2013) https://doi.org/10.1117/12.2030605
KEYWORDS: Semiconducting wafers, Logic, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Imaging systems, Lithography, Image resolution, Chemically amplified resists, Scanners

Proceedings Article | 1 April 2013 Paper
Rudy Peeters, Sjoerd Lok, Erwin van Alphen, Noreen Harned, Peter Kuerz, Martin Lowisch, Henk Meijer, David Ockwell, Eelco van Setten, Guido Schiffelers, Jan-Willem van der Horst, Judon Stoeldraijer, Robert Kazinczi, Richard Droste, Hans Meiling, Ron Kool
Proceedings Volume 8679, 86791F (2013) https://doi.org/10.1117/12.2010932
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Overlay metrology, Image resolution, Mirrors, Lithography, Wafer-level optics

Proceedings Article | 4 December 2008 Paper
Joost Bekaert, L. Van Look, P. De Bisschop, J. Van de Kerkhove, G, Vandenberghe, K. Schreel, J. Menger, G. Schiffelers, E. Knols, H. van der Laan, R. Willekers
Proceedings Volume 7140, 714027 (2008) https://doi.org/10.1117/12.804670
KEYWORDS: Semiconducting wafers, Scanners, Reticles, Critical dimension metrology, Optical proximity correction, Optics manufacturing, Cadmium, Photomasks, Metrology, Electroluminescence

Proceedings Article | 7 March 2008 Paper
L. Van Look, Joost Bekaert, Peter De Bisschop, Jeroen Van de Kerkhove, Geert Vandenberghe, Koen Schreel, Jasper Menger, Guido Schiffelers, Edwin Knols, Rob Willekers
Proceedings Volume 6924, 69241Q (2008) https://doi.org/10.1117/12.772598
KEYWORDS: Semiconducting wafers, Scanners, Reticles, Critical dimension metrology, Optical proximity correction, Optics manufacturing, Wafer-level optics, Cadmium, Photomasks, Solids

Showing 5 of 22 publications
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